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Al-N共掺杂ZnO的第一性原理研究
  • 期刊名称:人工晶体学报
  • 时间:0
  • 页码:293-297
  • 语言:中文
  • 分类:O731[理学—晶体学]
  • 作者机构:[1]太原理工大学洁净化工研究所,太原030024, [2]太原理工大学材料科学与工程学院,太原030024
  • 相关基金:国家自然科学基金(No.20876104 20771080); 山西省科技攻关项目(No.20090311082)
  • 相关项目:太阳光响应型纳米复合半导体氧化物的构筑及光电催化性能研究
中文摘要:

为了研究p型ZnO的掺杂改性,本文运用第一性原理密度泛函理论研究了未掺杂,Al、N单掺杂和Al-N共掺杂ZnO晶体的几何结构、能带结构、电子态密度。计算结果表明:未掺杂,Al、N单掺杂和Al-N共掺杂ZnO的超晶胞体积分别为0.2043 nm3、0.2034 nm3、0.2027 nm3、0.1990 nm3,带隙分别为0.72 eV、0.71 eV、0.60 eV、0.55 eV;N是比较理想的p型掺杂受主,若在禁带中再引入激活施主Al后,可填充的电子数由原来的19个增加到24个,N原子接受从价带跃迁的电子使价带产生非局域化空穴载流子,从而提高了晶体的导电性。与未掺杂,Al、N单掺杂相比,Al-N共掺杂ZnO具有更稳定的结构,更窄的带隙,更好的导电性,更有利于实现p型化。

英文摘要:

In order to study the doping modification of the p-type ZnO,the geometric structure,band structure and state density of pure ZnO,Al-doped,N-doped and Al-N co-doped ZnO were investigated by the first-principles density functional theory in this paper.The calculation results show that the supercell volume and band gap of pure ZnO,Al-doped,N-doped and Al-N co-doped ZnO are 0.2043 nm3,0.2034 nm3,0.2027 nm3,0.1990 nm3 and 0.72 eV,0.71 eV,0.60 eV,0.55 eV,respectively;N is an ideal p-type doping agent,the number of filled electrons increase from 19 to 24 after the re-introduction of the activated donor Al in the band gap,and N accepting the electrons jumping from the valence band makes the valence band produce delocalized hole carriers,which enhances the conductivity of the crystal.Compared with pure ZnO and Al,N single-doped ZnO,Al-N co-doped ZnO has better stable structure,a narrower band gap,better conductivity,thus it is more beneficial for the formation of p-type ZnO.

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