位置：成果数据库 > 期刊 > 期刊详情页
CHARACTERISTICS OF THERMAL STRESS EVOLUTION DURING THE COOLING STAGE OF MULTICRYSTALLINE SILICON
  • ISSN号：0149-5739
  • 期刊名称：Journal of Thermal Stresses
  • 时间：2013.9.2
  • 页码：947-961
  • 相关项目：提拉法生长大尺度蓝宝石单晶过程的数值模拟和晶体缺陷控制
作者： Fang, Haisheng|Zhang, Quanjiang|Pan, Yaoyu|Wang, Sen|Zhou, Naigen|Zhou, Lang|Lin, Maohua|
同期刊论文项目
提拉法生长大尺度蓝宝石单晶过程的数值模拟和晶体缺陷控制
期刊论文 23 会议论文 7
同项目期刊论文
Study of melt convection and interface shape during sapphire crystal growth by Czochralski method
Integrated study of lead iodide crystal growth and doping processes
Role of internal radiation at the different growth stages of sapphire by Kyropoulos method
<span class="mainTitle">Crystal cracking analysis and three-dimensional effects duri
<span class="mainTitle">Transient analysis of the cooling process and influence of b
Crystal cracking analysis and three-dimensional effects during Kyropoulos sapphire growth
<span class="hitHilite">A</span> <span class="hitHilite">modif
The Effects of Wind and Posture on the Aerodynamic Performance During the Flight Stage of Skiing
Numerical Study of the Micro-Pulling-Down Process for Sapphire Fiber Crystal Growth
<span class="blue_text">Hot zone design for controlled growth to mitigate cracking i
Influence of furnace design on the thermal stress during directional solidification of multicrystall
To investigate interface shape and thermal stress during sapphire single crystal growth by the Cz me