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Ultrafast epitaxial growth of metre-sized single-crystal graphene on industrial Cu foil

ISSN号：0023-074X
期刊名称：《科学通报》
时间：0
分类：TN304.054[电子电信—物理电子学] TN304.12[电子电信—物理电子学]
作者机构：[1]State Key Laboratory for Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China, [2]Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China, [3]Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), UIsan 689-798, Republic of Korea, [4]Centre for Nanochemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China, [5]Department of Biomedical Engineering, College of Engineering, Peking University, Beijing 100871, China, [6]College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China, [7]Collaborative Innovation Centre of Quantum Matter, Beijing 100871, China, [8]International Centre for Quantum Materials, Peking University, Beijing 100871, China, [9]Department of Chemistry, Ulsan National Institute of Science and Technology (UNIST), Ulsan 689-798, Republic of Korea, [10]Department of Physics, South University of Science and Technology of China, Shenzhen 518055, China, [11]School of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 689-798, Republic of Korea
相关基金：Acknowledgments We thank Feng Wang and Ting Cao for useful discussion and proofreading of the manuscript. This work was supported by National Key R＆D Program of China （2016YFA0300903, 2016YFA0300802, 2014CB932500 and 2016YFA0200101）, National Natural Science Foundation of China （51522201, 11474006, 11327902, 11234001, 21525310, 91433102 and 21573186）, Postdoctoral Innovative Personnel Support Program （BX201700014） and National Program for Thousand Young Talents of China and the Institute for Basic Science （IBS-R019-D1） of Korea.

作者： Xiaozhi Xu[1,2], Zhihong Zhang[1,2], Jichen Dong[3], Ding Yi[3], Jingjing Niu[1], Muhong Wu[1], Li Lin[4], Rongkang Yin[5], Mingqiang Li[1], Jingyuan Zhou[4], Shaoxin Wang[1], Junliang Sun[6], Xiaojie Duan[4,5], Peng Gao[1,4,7], Ying Jiang[7,8], Xiaosong Wu[1,7], Hailin Peng[4], Rodney S. Ruoff[3,9], Zhongfan Liu[4], Dapeng Yu[1,7,10], Enge Wang[7,8], Feng Ding[3,11], Kaihui Liu[1,4,7]

关键词：外延生长, 单晶硅, 工业级, 石墨, 铜箔, 尺寸, CU(111), 现代技术, Single-crystal Industrial Cu Graphene Ultrafast Epitaxial

中文摘要：

Corresponding authors. E-mail addresses： egwang@pku.edu.cn （E. Wang）, Corresponding authors. E-mail addresses： f.ding@unist.ac.kr （F. Ding）, Corresponding authors. E-mail addresses： khliu@pku.edu.cn （K. Liu）.

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