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Initial dislocation topologies of nanoindentation into copper (0 0 1) film with a nanocavity
  • ISSN号：0013-7944
  • 期刊名称：Engineering Fracture Mechanics
  • 时间：0
  • 页码：3329-3340
  • 相关项目：具有挠曲电效应的纳米电介质的力电行为及缺陷分析
作者： Yu, Wenshan|Shen, Shengping|
同期刊论文项目
具有挠曲电效应的纳米电介质的力电行为及缺陷分析
期刊论文 15
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