采用无机盐-螯合-溶胶凝胶法成功制备了BiFeO3薄膜。研究了不同基片、热处理工艺对薄膜相结构的影响。通过DTA-TG与FT IR对溶胶前躯体进行表征,分析了BiFeO3溶胶与薄膜过程机理并确定了铁电相转变温度为856℃。通过XRD、SEM分析了薄膜的晶相及表面形貌。结果表明,薄膜呈随机取向,氮气环境中退火可提高薄膜结晶度。600℃退火下薄膜厚度平均是400nm左右。VSM表明随着退火温度的增加,BiFeO3薄膜的磁化率增大。
BiFeO3 films were successfully fabricated by inorganic-chelating-gel method. The effect of subtracts and heat treatments on films phase structures were investigated. Precursors were characterized by DTA-TG and FT IR. Mechanism of the sol and as-grown BiFeO3 thin films were analyzed and phase transition temperature of 343℃ was determined. Crystal phase and surface morphology of films were analyzed by XRD,SEM. The results showed that thin films were random orientation and crystalline of films was enhanced in nitrogen atmosphere. The average thicknesses of film annealing at 600℃ was 400nm. VSM indicated magnetic susceptibility increased with the increase of annealing temperature.