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Monoatomic layer removal mechanism in chemical mechanical polishing process: A molecular dynamics st
  • ISSN号：0021-8979
  • 期刊名称：Journal of Applied Physics
  • 时间：0
  • 页码：196-201
  • 语言：英文
  • 相关项目：微纳制造中的表面/界面行为及控制技术研究
作者： Luo, Jianbin|Si, Lina|Guo, Dan|Lu, Xinchun|
同期刊论文项目
微纳制造中的表面/界面行为及控制技术研究
期刊论文 66 会议论文 12 获奖 7
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