欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
期刊
> 期刊详情页
Effects of high-temperature O2 annealing on Al2O 3 blocking layer and Al2O3/Si3N 4 interface for MAN
ISSN号:0022-3727
期刊名称:Journal of Physics D: Applied Physics
时间:2012
页码:1-5
相关项目:面向三维集成的纳米尺度电荷陷阱存储器机理与可靠性研究
作者:
Zhu, Chenxin|Huo, Zongliang|Zhao, Shengjie|Liu, Ming|
同期刊论文项目
面向三维集成的纳米尺度电荷陷阱存储器机理与可靠性研究
期刊论文 24
会议论文 15
同项目期刊论文
Improved performance of non-volatile memory with Au-Al2O3 core-shell nanocrystals embedded in HfO2 m
A write buffer design based on stable and area-saving embedded SRAM for flash applications
A 65-nm 1-Gb NOR floating-gate flash memory with less than 50-ns access time
In situ electron holography study of charge distribution in high-κ charge -trapping memory
Impact of continuing scaling on the device performance of 3D cylindrical junction-less charge trappi
Performance-improved nonvolatile memory with aluminum nanocrystals embedded in Al(2)O(3) for high te
Charge Loss Characteristics of Different Al Contents in a HfAlO Trapping Layer Investigated by Vari
Low temperature atomic layer deposited HfO2 ?lm for high performance charge trapping ?ash memory ap
A Study of P/E Cycling Impaction on Drain Disturb for 65nm NOR Flash Memories by Low Frequency Noise
Low temperature post deposition annealing investigation for 3D charge trap flash memory by kelvin pr
电荷俘获存储器阻挡层研究进展
硅纳米晶存储器的耐受性研究
Impact of continuing scaling on the device performance of 3D cylindrical junction-less charge trapping memory
Investigation of charge loss characteristics of HfO2 annealed in N2 or 02 ambient
Comparison between N2 and O2 anneals on the integrity of an Al2O3/SiaN4/SiO2/Si memory gate stack