中文摘要：

介绍了上海光源X射线干涉光刻（XIL）光束线的基本情况.为实现光束线的光束偏转和光路切换,完成了其偏转镜系统的研制.分析了偏转镜系统的功能,设计了偏转镜的调节机构、切换机构和冷却结构.论述了调节机构的关键运动,即镜箱外直线运动转化为超高真空内旋转运动的实现过程;讨论了切换机构重复精度与承载能力之间的关系,并完成了精密丝杆的校核.采用镜子支撑方式和冷却方式集成的方案设计了冷却结构,并通过数值模拟分析了冷却结构和冷却效果.模拟结果表明镜子子午面形误差和弧矢面形误差分别约为6.5 rad和7 rad.应用激光干涉仪和光电自准直仪对调节机构和切换机构进行了测试,结果表明：调节机构的线性分辨力可达0.2 μm,切换机构的重复精度满足设计要求.

英文摘要：

The X-ray interference lithography （XIL） beamline at Shanghai Synchrotron Radiation Facility was introduced.To achieve the beam deflection and optical pathway switch of the beamline,a deflecting mirror system of XIL beamline was designed.The function of the deflecting mirror system was analyzed and its adjusting mechanism,switching mechanism and cooling structure were designed respectively.The key movement of adjusting mechanism was discussed,which is the translating process of a linear motion outside the mirror chamber into a rotary motion in ultra high vacuum.Then,the relationship between repeatability and carrying capacity of the switching mechanism was analyzed,and the strength of precision screw was checked.A cooling structure was designed by integrating a mirror support mode and a cooling mode,and the cooling effect was analyzed by numerical simulation method.The simulated results show that the meridian direction slope error and the sagittal direction slope error of the deflection mirror are about 6.5 rad and 7 rad respectively.The precisions of adjusting mechanism and switching mechanism were tested by a laser interferometer and a photoelectric autocollimator,and testing results show that linear resolution capability of adjusting mechanism is up to 0.2 μm,and the repeatability of switching mechanism satisfies the technical demands.