中文摘要：

在深入探讨DMD（Digital Mirror Device）灰度图形传递的特点基础上，把曝光量分布作为分析数字光刻成像的物理量，建立了数字灰度光刻的成像模型．以制作微米量级微透镜为例，通过模拟分析，讨论了数字光刻过程中DMD的工作方式、成像系统参量对抗蚀剂曝光量分布的影响，揭示了数字灰度光刻成像机理，为开展数字光刻实验研究提供了理论根据．

英文摘要：

The characteristic of the gray-tone pattern generated by DMD is discussed and an imaging model for describing the digital gray-tone lithography process is developed. In addition, the effects of DMD operation mode and the parameters of imaging system to the distribution of the exposure dose on the photoresist are simulated and discussed. The model will be helpful for the experimental research on the digital lithography.