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Growth of thick MOD-derived CeO2？x buffer layer with less residual carbon for coated conductors
  • ISSN号：0957-4522
  • 期刊名称：Journal of Materials Science: Materials in Electro
  • 时间：2015
  • 页码：8949-8953
  • 相关项目：氧化铈缓冲层的稳定化生长与调控机理研究
作者： J. F. Huang|C. S. Li|Z. M. Yu|P. X. Zhang|
同期刊论文项目
氧化铈缓冲层的稳定化生长与调控机理研究
期刊论文 22 专利 1
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