中文摘要：

分子玻璃材料和多光子光刻技术分别是近年来光刻胶和光刻技术领域的研究热点．本文对分子玻璃正性光刻胶在多光子光刻中的应用进行了探索，设计合成了叔丁氧基羰基保护的杯[4]芳烃衍生物分子玻璃材料，将其作为主体材料与光生酸剂三氟甲磺酸三苯锍翁盐进行复配，制备了分子玻璃正性光刻胶，探讨并优化了光刻胶的成分配比及其在紫外光曝光下的显影工艺．利用780nm波长飞秒激光对所制备的分子玻璃正性光刻胶进行了多光子光刻特性的评价，实验得到了最低线宽180nm的线条和复杂的二维微结构图形，结果表明杯[4]芳烃衍生物分子玻璃正性光刻胶有望应用于多光子光刻技术．

英文摘要：

Molecular glass and multi-photon lithography have attracted great interest in their respective research areas. In this study, we intended to apply molecular glass in multi-photon lithography. T-Boc protected calix[4]resorcinarene derivatives have been designed and used as molecular glass. Positive-tone molecular glass resist was built by this molecular glass and triphenysulfonium triflate used as photoacid generator. The ratio of compounds in this resist and the requirements of development process were optimized and discussed. Appling this novel resist in multi-photon lithography, feature size as small as 180 nm for line/space and integral 2D patterns were achieved after patterning and development. The results revealed the feasibility that calix[4]resorcinarene derivatives molecular glass resists can be applied in multi- photon lithography.