中文摘要：

electrodeposited 镍 hexacyanoferrate (NiHCF ) 的离子选择薄电影用电气化学的阻抗光谱学(EIS ) 和周期的 voltammetry (CV ) 被调查。NiHCF 薄电影被 cathodic 免职在磅和艾尔底层上准备。EIS 和 CV 曲线在 1 mol/L (KN03+CsNO3 ) 和 1 个 mol/L (NaNO3+CsNO3 ) 混合答案被决定，它对在电解质的 Cs+ 的集中敏感。所有 Nyquist 阻抗阴谋显示出的试验性的结果表演在变化在上的高周波的范围压抑半圆进在更低的频率的直线。与增加 Cs+ 的数量，在曲线向更积极的价值和氧化还原作用山峰转移的 CV 的氧化还原电位拓宽：在相应 EIS 曲线和费用转移抵抗的半圆半径也增加。EIS 联合 CV 能提供珍贵卓见进 NiHCF 薄电影的离子选择。

英文摘要：

The ion selectivity of electrodeposited nickel hexacyanoferrate （NiHCF） thin films was investigated using electrochemical impedance spectroscopy （EIS） and cyclic voltammetry （CV）. NiHCF thin films were prepared by cathodic deposition on Pt and Al substrates. EIS and CV curves were determined in 1 mol/L （KNO3＋C5NO3） and 1 mol/L （NaNO3＋CsNO3） mixture solutions, which were sensitive to the concentration of Cs^＋ in the electrolytes. Experimental results show that all Nyquist impedance plots show depressed semicircles in the high-frequency range changing over into straight lines at lower frequencies. With increasing amounts of Cs^＋, the redox potentials in CV curves shift toward more positive values and the redox peaks broaden; the semicircle radius in corresponding EIS curves and the charge transfer resistance also increase. EIS combining CV is able to provide valuable insights into the ion selectivity of NiHCF thin films. 2008 University of Science and Technology Beijing. All rights reserved.