在基片温度173K的条件下,采用直流反应磁控溅射法制备MoO3薄膜。运用XRD、SEM、可见分光光度计、伏安特征曲线、拉曼光谱研究分别对薄膜的晶体结构、微观表面形貌、透射光谱特性、电致变色性能及成分进行分析,探讨了MoO3薄膜的电致变色性能和微观结构之间的关系。结果表明,超低温有利于MoO3薄膜非晶化,薄膜表面有较多的孔隙,有利于Li^+的抽取,进而显示出很好的变色性能,在550nm处着色系数达到了41.6cm^2/c,可见光400-800nm范围内着色态和漂白态平均透光率差值达60%以上。Raman光谱分析发现,在拉曼位移831cm^-1、952cm^-1。处有强的吸收峰,其中831cm^-1处对应于O-Mo^6+-O的伸缩振动模式,952cm^-1对应于M0^6+=O的弯曲振动模式。
Amorphous MoO3 electrochromic films were deposited by DC reactive magnetron sputtering below 173K. X-ray Diffraction (XRD), Raman spectroscopy are used Scanning Electron Microscopy (SEM), spectrophotometer, cyclic vohammograms and to analyze the structure, composition, morphology, transmittance property of the films and electrochromic performance respectively. The relationship between the microstructure and electrochromic performance of the MoO3 film is also studied. Results reveal that the samples are amorphous and have more pores that are beneficial for Li^+ to inject and eject. The coloration efficiency reached 41.6cm^2/c at 550 nm and the variation of average transmittance between the bleached and colored state reached 60% in the wavelength range 400-800nm. The Raman spectra show a strong peak at 831cm^-1 due to vibrations of the O-Mo^6+-O bonds and at 952cm^-1 assigned to Mo^6+=O stretch mode.