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“Double Exposure Method”: a Novel Photolithographic Process to Fabricate Flexibl
  • ISSN号：1944-8244
  • 期刊名称：ACS Applied Materials & Interfaces
  • 时间：2013.4.10
  • 页码：2316-2319
  • 相关项目：高分子光电功能材料
作者： Qing Meng|Zongrui Wang|Hantang Zhang|Wenping Hu|
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高分子光电功能材料
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