研究了Ga2O3/In膜反应自组装制备GaN薄膜,再将Ga2O3/In膜在高纯氨气气氛中氨化反应得到GaN薄膜,用X射线衍射(XRD),傅里叶红外吸收(FTIR),扫描电镜(SEM),原子力显微镜(AFM),透射电镜(TEM)对样品进行结构,形貌的分析。测试结果表明:用此方法得到了六方纤锌矿结构的GaN多晶膜,且900℃时成膜的质量最好。
GaN films were synthesized by ammoniating GazO3/In films deposited on Si(111)substrates. The sample were characterized by X-ray diffraction(XRD), fourier transformed spetra(FTIR), scanning electron microscopy(SEM), atomic force microscopy(AFM)and transmission electron microscopy(TEM). The results show that the films synthesized were hexagonal GaN single crystals.