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Enhanced photocathodic behaviors of Pb(Zr0.20Ti0.80)O-3 films on Si substrates for hydrogen producti
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：2015.6.15
  • 页码：243901-
  • 相关项目：基于电极/膜界面势垒与退极化场的铁电薄膜光阴极制备及其光电化学特性
作者： Dong, Wen|Zheng, Fengang|Fang, Liang|Shen, Mingrong|
同期刊论文项目
基于电极/膜界面势垒与退极化场的铁电薄膜光阴极制备及其光电化学特性
期刊论文 22
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