欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
期刊
> 期刊详情页
Simulation study on 4H-SiC power devices with high-k dielectric FP terminations
ISSN号:0925-9635
期刊名称:Diamond and Related Materials
时间:2012.2.2
页码:42-47
相关项目:新型高功率4H-SiC JBS二极管的研究
作者:
Song, Qing-Wen|Zhang, Yu-Ming|Zhang, Yi-Men|Tang, Xiao-Yan|
同期刊论文项目
新型高功率4H-SiC JBS二极管的研究
期刊论文 14
会议论文 1
专利 3
同项目期刊论文
Study of the effect of lithography deviation on 4H-SiC floating junction junction barrier Schottky d
4H-SiCn-MOSFET新型反型层迁移率模型
Investigation of surface morphology and ion activation of aluminium implanted 4H-SiC
Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode
Investigation of a 4H-SiC metal-insulation-semiconductor structure with an Al2O3/SiO2 stacked dielec
Simulation study of a mixed terminal structure for 4H-SiC merged PiN/Schottky diode
Temperature-dependent characteristics of 4H-SiC junction barrier Schottky diodes
4H—SiC n—MOSFET新型反型层迁移率模型
N型4H—SiC低温拉曼光谱特性
First-principles calculation on the concentration of intrinsic defects in 4H-SiC
套刻偏差对4H-SiC浮动结结势垒肖特基二极管的影响研究
Investigation of current transport parameters of Ti/4H-SiC MPS diode with inhomogeneous barrier
Edge termination study and fabrication of a 4H-SiC junction barrier Schottky diode