为提高808nm、垂直腔面发射半导体激光器(VCSEL)的输出功率与电光转换效率,对其湿法氧化工艺进行了实验研究。采用扫描电镜(SEM)的微区分析功能,对样品氧化层按不同的氧化深度进行微区分析。微区分析结果表明:适当降低氧化温度,延长氧化时间,可减小氧化限制孔径的控制误差,提高氧化工艺的准确性;氧化后对样品进行高温加热处理,可减少氧化层中的As含量,改善氧化层的质量,提高氧化工艺的热稳定性。
Wet oxidation experiments of the samples were carried out in order to improve the power and the conversion efficiency of 808 nm vertical-cavity surface-emitting laser (VCSEL). Micro-probe analyses were done at the different oxidation depths of oxidation layer by scaning electron microscope (SEM). The analyzed results show that the oxide-aperture can become more precise by lowering oxidation temperature and proloning oxidation time; the As content in oxidation layer decreases, the oxidation layer quality and thermal stability can be improved by heating the samples after oxidating.