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滚型纳米压印工艺的研究进展和技术挑战
  • 期刊名称:青岛理工大学学报
  • 时间:2013.3.3
  • 页码:79-85
  • 分类:TN305.7[电子电信—物理电子学]
  • 作者机构:[1]青岛理工大学纳米制造和光电子实验室,青岛266033
  • 相关基金:国家自然科学基金重大研究计划(91023023); 教育部新世纪优秀人才支持计划项目(NCET-11-1029)
  • 相关项目:大面积、高度均匀有序量子点阵列制造及其在量子点激光器中的应用
中文摘要:

滚型纳米压印光刻是一种高效、低成本制造大面积微纳米结构的新型图形化方法,不同于传统的平板式纳米压印工艺,滚型纳米压印具有高效、连续压印独特的优势.它在抗反射光学薄膜、太阳能电池、柔性电子器件、OLED、大尺寸LCD显示、微流控器件等领域已经展示了巨大的潜能和商业化应用前景.综述了滚型纳米压印工艺的最新研究进展,并讨论了其面临的挑战性技术难题、未来的发展趋势和工业化应用前景.

英文摘要:

It is well known that roller-type nanoimprint lithography(NIL) is an emerging patterning technology which has the ability to high volume manufacturing micro-and nanostructures with high throughput and low cost.Compared with the conventional nanoimprint lithography process,roller-type NIL has a unique advantage of continuous patterning.This technique is attractive to researchers in the world because of its inherent advantages,and has demonstrated great commercial prospects in a variety of application areas including anti-reflective film,solar cells,flexible electronics,OLED,LCD,micro-fluidic devices,etc.This paper presents recently major progresses in roller-type NIL.Furthermore,prospects,challenges and future directions for the roller-type NIL are also discussed.

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