三氟化硼乙醚+10%乙醚体系中,恒电位(1.23~2.23V vs .SCE)条件下可以获得高质量聚膜(PNI),这是首次获得硝基取代高性能导电高分子膜材料。5-硝基吲哚(NI)的起始氧化电位为1.04V vs.SCE。电流-时间曲线、FTIR和^1H NMR结果均表明聚合电位对PNI膜质量有较大影响。低电位有利于NI的聚合,且有利于增加PNI膜的共轭链长;高电位会导致NI的副反应,从而降低PNI膜的质量。同时红外光谱和^1H NMR研究表明,NI的电化学聚合是通过2,3位进行的。
High quality poly (5-nitroindole) (PNI) films can be synthesized electrochemically by direct anodic oxidation of 5-nitroindole (NI) in boron trifluoride diethyl etherate (BFEE) at different polymerization potential in the range of 1.23-2.23 V (vs. SCE). To the best of our knowledge, this is the first time that high quality polymer films of nitro group substituted conducting polymers were electrodeposited. The oxidation onset potential of NI was only 1.04 V vs. SCE in this medium. Chronoamperometric response of NI, FTIR and 1H NMR indicated that the polymerization potential had a great effect on the quality of PNI films. Lower potential is helpful for the electrochemical polymerization of NI and the extension of the conjugation length of PNI. On the other hand, a higher potential led to side reactions and poor polymer film quality. The structural characterization of PNI films by FTIR and ^1H NMR indicated that the electrochemical polymerization of NI occurred at C2 and C3 positions.