选择溶剂蒸汽,即, cyclohexanone 或 isopropyl 苯, poly 是差的溶剂为,和为 fullerene 衍生物的好溶剂[ 6,6 ] -phenyl-C61-butyric 酸甲基酉旨( PCBM ),被采用减少 PCBM 总数的尺寸并且在 P3HT/PCBM 电影延长大 PCBM 总数的形成时间。PCBM 在退火的开始几分钟 1020 nm 规模形式起核心作用并且聚集。然后, PCBM 总数的尺寸保持未改变直到为 60 min 退火。最后,微米尺寸的更大的 PCBM 总数以后形成了小时。相反, PCBM 总数的生长率更快,当为两个部件与好溶剂蒸汽对待时,他们的尺寸更大。P3HT crystallinity 是有退火的不同类型的一样溶剂,尽管 P3HT 组织工会的率在退火的选择溶剂蒸汽以后被减少。因为阶段分离的更小的尺寸,设备比在好溶剂蒸汽退火了的在选择溶剂蒸汽退火了因为 30 min 有更高的 PCE。
A selective solvent vapor, i.e., cyclohexanone or isopropyl benzene, which is a poor solvent for poly(3-hexylthiophene-2,5-diyl) (P3HT) and a good solvent for fullerene derivative [6,6]-phenyl-C61-butyric acid methyl ester (PCBM), was employed to reduce the size of PCBM aggregates and prolong the formation time of big PCBM aggregates in P3HT/PCBM film. PCBM nucleates and aggregates of 10-20 nm scale form in the first few minutes annealing. Then the size of PCBM aggregates kept unchanged until annealing for 60 min. Finally, larger PCBM aggregates of micron-size formed hours later. On the contrary, the growth rate of PCBM aggregates was faster and their size was larger when treated with a good solvent vapor for both components. The P3HT crystallinity was the same with different types of annealing solvents, although the rate of P3HT self-organization was decreased after a selective solvent vapor annealing. Because of the smaller size of phase separation, the device annealed in a selective sol- vent vapor for 30 min had a higher PCE than that annealed in a good solvent vapor.