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Thermal stability of cubic boron nitride films deposited by chemical vapor deposition
  • ISSN号：1520-6106
  • 期刊名称：Journal of Physical Chemistry B
  • 时间：0
  • 页码：21073-21076
  • 语言：英文
  • 相关项目：氟和离子轰击在立方氮化硼化学气相合成中的交互作用机理
作者： Wong, K. Y.|Yu, J.|Lau, W. M.|Matsumoto, S.|Ong, H. C.|Zheng, Z.|
同期刊论文项目
氟和离子轰击在立方氮化硼化学气相合成中的交互作用机理
期刊论文 10 专利 3
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