传统的曝光技术等平面工艺通常只能获得边缘陡峭的平面结构。通过多层曝光、灰度曝光、聚焦离子束加工等方法可以实现高度渐变的准三维结构的构造,却往往难以获得良好的光滑度。本文结合电子束曝光技术、PMMA结构平滑技术、模板剥离技术,实现了多种多样的渐变结构的构造。这种技术具有构造方法简单、表面粗糙度小、可自由定位等众多优点。
Only planar pattern with sharp edges can be fabricated by traditional lithography methods.Quasi-3D structures with gradually changed altitude can be obtained by means of multi-layer lithography,gray-scale photolithography and focused ion beam mining.However,desirable surface smoothness can hardly be achieved.Combining electron beam lithography,PMMA smoothing technique and template stripping method,the fabrication of diverse sloped metal patterns were realized.The method promises easy fabrication of high-quality sloped metal patterns with well-defined pattern positioning.