Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique
- ISSN号：1009-0630
- 期刊名称：《等离子体科学与技术：英文版》
- 时间：0
- 分类：O484.43[理学—固体物理;理学—物理] TQ323.41[化学工程—合成树脂塑料工业]
- 作者机构：[1]Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China, [2]University of Science and Technology of China, Hefei 230026, People's Republic of China
- 相关基金：This work was financially supported by National Natural Science Foundation of China （No. 11374299）.
作者：
宋亮[1], 王先平[1], 王乐[1,2], 张营[1,2], 刘旺[1], 蒋卫斌[1], 张涛[1], 方前锋[1], 刘长松[1]
关键词：
射频等离子体, 磁控溅射法, 镍薄膜, ODS, 制备, 纳米Y2O3, X射线光电子能谱, 射频磁控溅射方法, radio-frequency plasma magnetron sputtering, He-charged FeCrNi-based film,nanoindentation hardness, elastic recoil detection, He implantation
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