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Unstable kinetic roughening during the island coalescence stage of sputtered tantalum films
  • ISSN号：0021-8979
  • 期刊名称：Journal of Applied Physics
  • 时间：0
  • 页码：1-5
  • 相关项目：应变硅/硅锗微细特征单元结构失稳及应变弛豫研究
作者： Yang, J. J.|Tang, J.|Liu, N.|Ma, F.|Tang, W.|Xu, K. W.|
同期刊论文项目
应变硅/硅锗微细特征单元结构失稳及应变弛豫研究
期刊论文 18
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