中文摘要：

利用ZrCl4-Ar-CH4-H2体系,采用化学气相沉积法（CVD）制备了ZrC涂层。研究了不同基底、沉积温度、先驱体中CH4与ZrCl4浓度比（C/Zr）对涂层形貌、物相和组分的影响规律和作用机制。结果表明,不同基底对该体系沉积的ZrC涂层形貌没有显著影响。沉积温度对ZrC涂层形貌影响较大,当温度从1100℃增加到1350℃时,涂层形貌由片状转变到荔枝状,且涂层中的C含量随温度的升高而增加。先驱体中的C/Zr比对涂层形貌和组分也有重要影响,当C/Zr比从8.5减小到3.5时,涂层由疏松多孔形貌经菜花状向玻璃态形貌演变,且涂层中的C含量随C/Zr比的减小而减少。

英文摘要：

ZrC coatings were prepared by chemical vapor deposition（CVD） using the ZrCl4-Ar-CH4-H2 system.The effects of the substrate species,deposition temperature and input concentration ratio of CH4 to ZrCl4（C/Zr） on the morphology,composition and phase of the coatings as well as the deposition mechanism of ZrC were studied.The experimental results show that the morphology of the ZrC coatings is insensitive to the substrate species.The morphologies and compositions of the ZrC coatings are significantly influenced by the deposition temperature and the input C/Zr ratio.The morphology of ZrC coating changes from a platelet structure to a fine-grained polycrystalline structure as the temperature increases from 1100 ℃ to 1350 ℃.As the input C/Zr ratio decreases from 8.5 to 3.5,the coatings morphology changes from a porous structure to a cauliflower structure and then to a glassy structure.The carbon content of the ZrC coatings increases with the temperature and the input C/Zr ratio.