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Nanoscale and spatial variations investigation of etch damage in integrated ferroelectric capacitor
  • ISSN号：0021-4922
  • 期刊名称：Japanese Journal of Applied Physics
  • 时间：0
  • 页码：280-283
  • 语言：英文
  • 相关项目：铁电纳米线的控制生长及纳米尺度铁电性能研究
作者： Deng, Zhao|Wang, Longhai|Dai, Ying|
同期刊论文项目
铁电纳米线的控制生长及纳米尺度铁电性能研究
期刊论文 31
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Etch damage evaluation in integrated ferroelectric capacitor side wall by piezoresponse force micros
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