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Dissociation Rates of H2 on a Ni(100) Surface: The Role of the Physisorbed State
  • ISSN号：1463-9076
  • 期刊名称：Physical Chemistry Chemical Physics
  • 时间：2014
  • 页码：13318-13328
  • 相关项目：甲烷分子在Ni(111)表面解离的表面原子振动作用及隧穿和同位素效应
作者： Wenji Wang|Yi Zhao|
同期刊论文项目
甲烷分子在Ni(111)表面解离的表面原子振动作用及隧穿和同位素效应
期刊论文 5
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Effect of Lattice Motion on Dissociation and Recombination Rates of H2 on Ni(100) Surface
The Direct and Precursor Mediated Dissociation Rates of H2 on a Ni(111) Surface
Quantum Instanton Calculation of Rate Constant for CH4+OH -> CH3+H2O Reaction: Torsional Anharmon
Reaction Rate Constants of CH4(ads) = CH3(ads) + H(ads) on Ni(111): The Effect of Lattice Motion