利用自主研发的圆柱谐振腔式MPCVD设备,在工作气压28kPa,微波功率5kW的条件下成功制备金刚石单晶,并采用光学显微镜、激光拉曼谱(Raman)技术对样品进行表征。结果表明,在高气压高功率条件下单晶的沉积速率高达26μm/h,且表面形貌平整。
A diamond singlecrystal was achieved by a newly developed cylindrical MPCVD reactor,with the gas pressure of 28 k Pa and the microwave power of 5 kW. The sample of synthetic diamond was characterized with optical microscopy and Raman spectroscopy. The results show that the single crystal diamond growth rate at high gas pressure and high microwave power is up to 26 μm / h and the morphology of the obtained single-crystal diamond are flat.