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Comparison of the thermal stability of NiSi films in NI/Pt(111)Si and Ni/Pt(100),SI systems
  • 期刊名称：J.Appl.Phys.
  • 时间：0
  • 作者或编辑：3448
  • 第一作者所属机构：Tsinghua University
  • 页码：2001,90,747-749
  • 语言：英文
  • 相关项目：金属材料结构与缺陷的计算模拟与原子尺度直接观察
作者： J.F.Liu.J.Y.Feng.J.Zhu|
同期刊论文项目
金属材料结构与缺陷的计算模拟与原子尺度直接观察
期刊论文 88
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