采用溶胶-凝胶技术在Si(111)和石英基片上制备8%(摩尔分数)Na掺杂ZnO薄膜。用X射线衍射仪、原子力显微镜、扫描电镜和接触角测试仪测试薄膜的微结构、表面形貌和表面接触角。结果表明:所有薄膜均具有较好的c轴择优取向,表面由近六边形棒状颗粒构成。随着退火温度升高,薄膜表面接触角由95°增大到106°。通过对薄膜交替进行紫外光照和黑暗放置(或热处理),可以实现其表面疏水与超亲水性之间的可逆转化,光诱导可逆转化效率随退火温度升高而增大。
Na-doped 8%(mole fraction) ZnO thin films were deposited on Si(111) or quartz substrate by sol-gel method.The microstructure,surface topography and water contact angle of the thin films have been measured by X-ray diffractometer(XRD),atomic force microscopy,scanning electron microscopy(SEM),and water contact angle apparatus.XRD results show that the thin films have a higher preferential c-axis orientation.SEM results reveal that the films consist of nearly hexagonal rod-like grains.With the increase of annealing temperature,the contact angle of the un-irradiated thin films increases from 95°to 106°.The hydrophobic thin films could be reversibly switched to super-hydrophilic by alternation of ultraviolet irradiation and dark storage(or thermal treatment).The photo-induced efficiency of the thin films increases with the increase of annealing temperature.