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IR variable angle spectroscopic ellipsometry study of high dose ion-implanted and annealed silicon w
  • ISSN号：0021-8979
  • 期刊名称：Journal of Applied Physics
  • 时间：0
  • 页码：401-409
  • 语言：英文
  • 相关项目：半导体材料特性的光学检测技术研究
作者： Liu, Xianming|Li, Bincheng|
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半导体材料特性的光学检测技术研究
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