中文摘要：

在磷酸盐体系下，采用恒压模式对氢化锆进行微弧氧化。考察了微弧氧化时间对氧化膜的厚度、结构、表面形貌、截面形貌以及阻氢性能的影响。利用扫描电子显微镜（SEM）、X射线衍射（XRD）、膜层测厚仪分析了氧化膜的表面形貌、截面形貌、相结构及膜层厚度。通过真空脱氢实验评估膜层的阻氢性能。结果表明：随着氧化时间的延长氢化锆表面微弧氧化膜层厚度由65．2Ixm增大至95．4μm；氧化膜的生长速度随着氧化时间的延长而逐渐降低；氧化时间对于膜层的结构没有明显影响，膜层主要由单斜相氧化锆（M-ZrO2）和四方相氧化锆（T-ZrO2）构成；氧化时间的增加有助于提高氧化膜的致密性和阻氢效果，当氧化时间为25min时，氧化膜的PRF值达到最大值11．6。

英文摘要：

Micro-arc oxidation （MAO） process was conducted on zirconium hydride in a phosphate system under the constant voltage mode. The influefice of oxidation time on thickness, structure, cross-sectional micro-morphology and hydrogen resistance of the oxide films was investigated. The surface and cross-sectional morphologies, phase structure and thickness of the oxide films were characterized by scanning election microscopy （SEM）, X-ray diffraction （XRD） and thickness gauge, respectively. Hydrogen resistance of the oxide films was evaluated by vacuum dehydrogenation. The results indicate that the thickness of the oxide film on the surface of zirconium hydride increases from about 65.2 to 95.4 μm with the increase of oxidation time. The growth rate of oxide films decreases with increasing of oxidation time. The oxidation time has no obvious influence on the phase structure of the oxide films. The oxide film is mainly composed of M-ZrO2 and T-ZrO2. The increase of oxidation time can improve the compactness and hydrogen resistance of the oxide films effectively. The PRF reaches up to the maximum value of 11.6 when the oxidation time is 25 min.