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Effects of Bias Voltage on the Structure and Mechanical Properties of Thick CrN Coatings Deposited by Mid-Frequency Magnetron Sputtering
  • ISSN号：1009-0630
  • 期刊名称：《等离子体科学与技术：英文版》
  • 时间：0
  • 分类：TN136[电子电信—物理电子学]
  • 作者机构：[1]Accelerator Lab, Department of Physics, Key Laboratory of Acoustic and Photonic Materialsand Devices of Ministry of Education, Wuhan University, Wuhan 430072, China
  • 相关基金：supported by National Natural Science Foundation of China （Nos. 10435060, 10675095）
作者： 容双全[1], 何俊[1], 王红军[1], 田灿鑫[1], 郭立平[1], 付德君[1]
关键词： CRN, 磁电管, 反应溅射法, 电压, CrN, middle-frequency magnetron sputtering, bias voltage
中文摘要：

E-mail address of FU Dejun： djfu@whu.edu.cn

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期刊信息
  • 《等离子体科学与技术：英文版》
  • 主管单位:中国科学院 中国科协
  • 主办单位:中国科学院等离子体物理研究所 中国力学学会
  • 主编：万元熙、谢纪康
  • 地址：合肥市1126信箱
  • 邮编：230031
  • 邮箱：pst@ipp.ac.cn
  • 电话：0551-5591617 5591388
  • 国际标准刊号：ISSN：1009-0630
  • 国内统一刊号：ISSN：34-1187/TL
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 美国化学文摘（网络版）,荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,美国科学引文索引（扩展库）,英国科学文摘数据库
  • 被引量:89