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Effects of Plasma Density Profile on Resistive Wall Mode Stability
  • 时间：0
  • 分类：O534.2[理学—等离子体物理;理学—物理]
  • 作者机构：[1]School of Information Engineering, Shandong Youth University of Political Science, Jinan 250103, China, [2]Key Lab of Information Security and Intelligent Control in Universities of Shandong, Jinan 250103, China, [3]Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China
  • 相关基金：National Natural Science Foundation of China （No. 11175156 ） ; Natural Science Foundation of Shandong Province of China （No. ZR2016AM30） ; Foundation of Shandong Province Higher Educational Science and Technology Program, China （No. J12LN16）
作者： 陈龙溪[1,2], 孟祥佳[1,2], 王进芳[2,3]
中文摘要：

Correspondence should be addressed to CHEN Longxi, E-mail： clx@sdyu, edu. cn

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