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Epitaxial evolution on buried cracks in a strain-controlled AIN/GaN superlattice interlayer between AIGaN/GaN multiple quantum wells and a GaN template
  • ISSN号:1674-1056
  • 期刊名称:《中国物理B:英文版》
  • 时间:0
  • 分类:TU441[建筑科学—岩土工程;建筑科学—土工工程] TN304.23[电子电信—物理电子学]
  • 作者机构:[1]State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China, [2]Collaborative Innovation Center of Quantum Matter, Beijing 100871, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (Grant Nos. 11174008 and 61361166007), the National Basic Research Pro- gram of China (Grant Nos. 2012CB619306 and 2012CB619301), and the Research Fund for the Doctoral Program of Higher Education of China (Grant No. 20100001120012).
中文摘要:

Epitaxial evolution of buried cracks in a strain-controlled AlN/GaN superlattice interlayer(IL) grown on GaN template, resulting in crack-free AlGaN/GaN multiple quantum wells(MQW), was investigated. The processes of filling the buried cracks include crack formation in the IL, coalescence from both side walls of the crack, build-up of an MQW-layer hump above the cracks, lateral expansion and merging with the surrounding MQW, and two-dimensional step flow growth.It was confirmed that the filling content in the buried cracks is pure GaN, originating from the deposition of the GaN thin layer directly after the IL. Migration of Ga adatoms into the cracks plays a key role in the filling the buried cracks.

英文摘要:

Epitaxial evolution of buried cracks in a strain-controlled AIN/GaN superlattice interlayer (IL) grown on GaN tem- plate, resulting in crack-free AIGaN/GaN multiple quantum wells (MQW), was investigated. The processes of filling the buried cracks include crack formation in the IL, coalescence from both side walls of the crack, build-up of an MQW-layer hump above the cracks, lateral expansion and merging with the surrounding MQW, and two-dimensional step flow growth. It was confirmed that the filling content in the buried cracks is pure GaN, originating from the deposition of the GaN thin layer directly after the IL. Migration of Ga adatoms into the cracks plays a key role in the filling the buried cracks.

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期刊信息
  • 《中国物理B:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国物理学会和中国科学院物理研究所
  • 主编:欧阳钟灿
  • 地址:北京 中关村 中国科学院物理研究所内
  • 邮编:100080
  • 邮箱:
  • 电话:010-82649026 82649519
  • 国际标准刊号:ISSN:1674-1056
  • 国内统一刊号:ISSN:11-5639/O4
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 被引量:406