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Effect of C：F Deposition on Etching of SiCOH Low-k Films in CHF3 60 MHz/2 MHz Dual-Frequency Capacitively Coupled Plasma
  • ISSN号：1009-0630
  • 期刊名称：《等离子体科学与技术：英文版》
  • 时间：0
  • 分类：O433.1[机械工程—光学工程;理学—光学;理学—物理] X701[环境科学与工程—环境工程]
  • 作者机构：[1]Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China, [2]Laboratory of Materials Modification by Beams, Dalian University of Technology Dalian 116024, China
  • 相关基金：supported by National Natural Science Foundation of China （Nos. 10635010, 10975029） and Beijing Key Laboratory of Printing ＆ Packaging Materials and Technology of Beijing Institute of Graphic Communication of China （No. KF201004）
作者： 施国峰[1], 叶超[1], 徐轶君[1], 黄宏伟[1], 袁圆[1], 宁兆元[1]
关键词： 等离子体反应器, 容性耦合, 均匀性, 光谱测量, 双频, 非均匀等离子体, 氩等离子体, 发射, dual frequency, capacitively coupled plasma, optical probe, plasma uniformity
中文摘要：

<正> Local measurement of plasma radial uniformity was performed in a dual frequencycapacitively coupled argon plasma (DF-CCP)reactor using an optical probe.The optical probecollects the light emission from a small separate volume in plasma,thus enabling to diagnosethe plasma uniformity for different experimental parameters.Both the gas pressure and the lowfrequency(LF)power have apparent effects on the radial uniformity of argon plasma.With theincrease in either pressure or LF power,the emission profiles changed from a bell-shaped to adouble-peak distribution.The influence of a fused-silica ring around the electrodes on the plasmauniformity was also studied using the optical probe.Possible reasons that result in nonuniformplasmas in our experiments are discussed.

英文摘要：

Local measurement of plasma radial uniformity was performed in a dual frequency capacitively coupled argon plasma （DF-CCP） reactor using an optical probe. The optical probe collects the light emission from a small separate volume in plasma, thus enabling to diagnose the plasma uniformity for different experimental parameters. Both the gas pressure and the low- frequency （LF） power have apparent effects on the radial uniformity of argon plasma. With the increase in either pressure or LF power, the emission profiles changed from a bell-shaped to a double-peak distribution. The influence of a fused-silica ring around the electrodes on the plasma uniformity was also studied using the optical probe. Possible reasons that result in nonuniform plasmas in our experiments are discussed.

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期刊信息
  • 《等离子体科学与技术：英文版》
  • 主管单位:中国科学院 中国科协
  • 主办单位:中国科学院等离子体物理研究所 中国力学学会
  • 主编：万元熙、谢纪康
  • 地址：合肥市1126信箱
  • 邮编：230031
  • 邮箱：pst@ipp.ac.cn
  • 电话：0551-5591617 5591388
  • 国际标准刊号：ISSN：1009-0630
  • 国内统一刊号：ISSN：34-1187/TL
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 美国化学文摘（网络版）,荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,美国科学引文索引（扩展库）,英国科学文摘数据库
  • 被引量:89