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Porous nanocrystalline Ti (CxN1-x) thick films by plasma electrolytic carbonitriding
  • ISSN号：1388-2481
  • 期刊名称：Electrochemistry Communications
  • 时间：0
  • 页码：267-272
  • 语言：英文
  • 相关项目：基于微弧放电的碳氮化钛厚膜形成机理及其力学行为多孔效应
作者： Li Xinmei|Han Yong|
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基于微弧放电的碳氮化钛厚膜形成机理及其力学行为多孔效应
期刊论文 18 会议论文 8 专利 2
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