采用垂直Bridgman法生长了In掺杂Cd0.3Mn0.2Te晶体(CdMnTe:In)和本征的Cd0.8Mn0.2Te晶体(CdMnTe)。X射线粉末衍射、X射线双晶摇摆曲线和位错密度测试表明,所生长晶体均为立方闪锌矿结构,半峰宽为40~80arc Sec,位错密度为100~100cm^-2,结晶质量良好.In掺杂不影响晶体的结构和结晶质量。电流.电压(I-V)测试表明,CdMnTe:In晶体的电阻率为1~3×10^9Ω·cm,与CdMnTe晶体相比上升了3个数量级.近红外光透过光谱(IR transmission)研究发现In掺杂后CdMnTe晶体红外透过率降低,在波数范围4000~1000cm^-1,CdMnTe晶体红外透过率为51.2%~56.4%,而CdMnTe:In的红外透光率为15.4%~6%。
Adopting vertical Bridgman method, an Indium (In) doped Cd0.8Mn0.2Te (CdMnTe: In) ingot and an intrinsic Cd0.8Mn0.2Te (CdMnTe) were grown. The crystalline structure and quality of the two ingots were verified by X-ray diffraction, double-crystal rocking curve measurement and etch pits density (EPD). The results showed a pure cubic zinc blende structure with the FWHM of 40~80 arc sec and EPD of I04~ 10s cm-2, which mean the as-grown ingots are with high crystalline perfection and the In dopant has no effect on the crystal structure. Current-voltage measurement shows that CdMnTe:In has the resistivity 1~3×10^9Ω·cm, which is three orders higher than that of undoped CdMnTe. IR transmission measurement exhibits that in the wavenumber range of 4000~ 1000 cm^-1 the IR transmittance of CdMnTe:In and CdMnTe is in between 15.4%~21.6% and 51.2%~56.4% respectively, indicating that In-doping results in a remarkable reduction of IR transmittance of CdMnTe crystal.