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高岭石层面羟基的硅烷嫁接改性机理
  • 期刊名称：矿物学报
  • 时间：2010.9.9
  • 页码：5-6
  • 分类：P57[天文地球—矿物学;天文地球—地质学]
  • 作者机构：中国科学院广州地球化学研究所, 中国科学院研究生院
  • 相关基金：国家自然科学基金(编号:U0933003);国家杰出青年基金(编号:40725006)
  • 相关项目：粘土矿物的表面反应性与有机硅烷化研究
作者： 杨淑勤|何宏平|袁鹏|朱建喜|覃宗华|刘冬|
关键词： 高岭石, 嫁接, 有机硅烷, 表面羟基, 八面体片, 硅烷化反应, 共价键, 层状硅酸盐矿物, 不同性质, 缩合
中文摘要：

高岭石[Al2Si2O5(OH)4]是一种1∶1型的层状硅酸盐矿物,其结构单元层由一层[SiO4]四面体片和一层[AlO6]八面体片组成,因此高岭石片层具有两种不同性质的表面:硅氧烷底面和羟基底面。高岭石的羟基底面为硅烷嫁接提供了场所,通过八面体片上的羟基与有机硅烷发生缩合形成Al-O-Si共价键,嫁接后的高岭石材料较之

同期刊论文项目
粘土矿物的表面反应性与有机硅烷化研究
期刊论文 35 会议论文 1
矿物学
期刊论文 38 会议论文 4
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