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Intrinsic Topological Insulator Bi(2)Te(3) Thin Films on Si and Their Thickness Limit
  • ISSN号：0935-9648
  • 期刊名称：Advanced Materials
  • 时间：2010.11.11
  • 页码：4002-4007
  • 相关项目：低维体系中的新奇量子现象
作者： Xue, Qi-Kun|Wang, Guang|Zhu, Xie-Gang|Liu, Min-Hao|Ye, Cun|Chen, Xi|Wang, Ya-Yu|He, Ke|Wang, Li-Li|
同期刊论文项目
低维体系中的新奇量子现象
期刊论文 158 会议论文 4
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