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Molecular Dynamics Simulation of Chemical Vapor Deposition Graphene Growth on Ni (111) Surface
  • ISSN号：1932-7447
  • 期刊名称：Journal of Physical Chemistry C
  • 时间：2012.3.15
  • 页码：6097-6102
  • 相关项目：石墨烯CVD生长机理和切割碳纳米管制备石墨烯纳米带的理论研究
作者： Meng, Lijuan|Sun, Qing|Wang, Jinlan|Ding, Feng|
同期刊论文项目
石墨烯CVD生长机理和切割碳纳米管制备石墨烯纳米带的理论研究
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