中文摘要：

基于一种新型的陶瓷抛光机，建立了抛磨均匀性的数学模型，通过对影响陶瓷墙地砖抛磨机抛磨均匀性的多方面因素进行了分析和模拟仿真，探讨了抛磨机各运动参数和几何参数对磨削均匀性的影响，并在该机器上进行现场的正交抛光试验，试验数据与模拟结果完全吻合，对该类机械的设计和改进具有十分重要的参考价值。

英文摘要：

A grinding evenness model is build up basing on a new-style ceramic tile polisher,this model indicates the affection on grinding evenness by the motive and geometric parameters through analized,simulated and emluated the grinding process of ceramic tile polisher,orthogonal experiment has been clone on the machine ,the result of the experiment is coincident with the emulated datas ,which afford very important referenced value for the design and improvement upon this kind of machine.