基于严格耦合波理论,分析了金属介质膜光栅的衍射性能,以-1级衍射效率为评价函数,研究了表面浮雕结构分别为HfO2和Si O2材料的金属介质膜光栅,获得衍射效率优于99%的结构参数。数值计算表明,当顶层光栅结构为HfO2和Si O2的槽深分别为80nm和225 nm时,在1 053 nm处获得接近100%的衍射效率。
The diffraction characteristic of metal and multi-layer dielectric grating(MMDG) was analyzed with the method of rigorous coupled wave.Taking the-1 order diffraction efficiency above 99% as the merit function,the parameters of MMDG are optimized with the top layer being HfO2 and SiO2,respectively.Numerical calculation shows that the diffraction efficiency can be closed to 100% when the groove depths are 80 nm for HfO2 and 225 nm for SiO2 on the top surface.