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Pushing the resolution of photolithography down to 15nm by surface plasmon interference
  • ISSN号：2045-2322
  • 期刊名称：Scientific Reports
  • 时间：2014.7.8
  • 页码：-
  • 相关项目：深紫外波段亚波长金属光栅的反转偏振特性研究
作者： Liu, Juan|Kang, Guoguo|Xie, Jinghui|Wang, Yongtian|
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深紫外波段亚波长金属光栅的反转偏振特性研究
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