超导Josephson隧道结是实现超导量子比特的基本元件。利用悬空掩膜和电子束斜蒸发相结合的工艺方法制备Al/Al2O3/Al超导Josephson隧道结,并且系统研究了底电极、上电极薄膜的厚度及氧化参数等工艺条件与隧道结超导电流密度上和面积归一化电阻Rc的关系。设计测量了三种方案的超导量子比特电路,通过对参数和结构的优化测出了较理想的量子比特(qubit)信号。
Superconducting Josephson junction is the basic element to achieve superconducting quantum bit (qubit). The authors used the suspended shadow mask and e -beam oblique evaporation to fabricate the Al / Al2O3/M superconducting Josephson tunnel junctions. The authors systematically studied the relationship between the thickness of the upper and bottom electrode, oxidation parameters and the superconducting current density Jc ,the area normalized resistance Rc of tunnel junction. Three programs of superconducting qubit circuit were designed. By improving the structure and parameters, the ideal qubit signal was measured.