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Etching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar and CF4/Arinductively coupled plasmas
  • ISSN号：0169-4332Electronic Resource Number: 10.1016/s0169-4332(03)00702-5
  • 期刊名称：Applied Surface Science
  • 时间：2014.5.9
  • 页码：68-73
  • 相关项目：纳米复合相变存储材料Si-Sb2Te3的相转变机理研究
作者： Z.H. Zhang, S.N. Song, Z.T. Song, Y. Cheng, M|D. Zhou|
同期刊论文项目
纳米复合相变存储材料Si-Sb2Te3的相转变机理研究
期刊论文 29
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