中文摘要：

采用脉冲激光沉积法在石英基片上沉积制备了ZrW208薄膜．用x射线衍射仪（XRD）、原子力显微镜（AFM）研究了不同衬底温度对薄膜结构组分、表面粗糙度和形貌的影响，用台阶仪和分光光度计测量薄膜的厚度和不同衬底温度下制备薄膜的透射曲线，用变温XRD分析了ZrW208薄膜的负热膨胀特性．实验结果表明：在衬底温度为室温、550℃和650℃下脉冲激光沉积的ZrW208薄膜均为非晶态，非晶膜在1200℃保温3min后淬火得到立方相ZrW208薄膜；随着衬底温度的升高，ZrW208薄膜的表面粗糙度明显降低；透光率均约为80％，在20～600℃温度区间内，脉冲激光沉积制备的ZrW208薄膜的负热膨胀系数为-11．378x10^-6K^-．

英文摘要：

ZrW2O8 thin films were deposited on quartz substrates by pulsed laser deposition method. Effects of substrate temperature on the microstructure, composition, surface roughness and morphology of the ZrW208 thin films were observed by X-ray diffraction （XRD） and atomic force microscope （AFM）. The thickness and optical transmit- tance of the ZrW208 thin films were measured by surface profilometer and spectrophotometer respectively. The negative thermal expansion property of the ZrW208 thin film was measured by high temperature X-ray diffraction. The resuits indicate that the as-deposited ZrW208 thin films deposited at the substrate temperature of room temperature, 550℃ and 650℃ are amorphous phase, and the cubic ZrW208 thin film can be obtained after annealing at 1200 ℃ for 3 min and then quenching in water. With the increase of deposition temperature, the surface roughness decreases markedly. The optical transmittances of the ZrW208 thin films prepared at different condition are about 80%, and the negative thermal expansion coefficient of the resulting cubic ZrW208 thin film is -11.378x 10^-6 K^-1 in the temperature range from 20℃ to 600℃.