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中文摘要：
针对三维曝光图形的结构特点,结合重复增量扫描方式,分别从水平和深度两个方向进行邻近效应校正.水平方向通过预先建立校正过程中需要的各种规则表,使所需参数可以通过查表获得,快速、准确地实现了邻近效应校正,深度方向的校正则是从吸收能量密度与曝光剂量的关系上考虑.利用SDS-3电子束曝光机完成了校正实验.AFM图显示,邻近效应已大大降低,可满足三维加工精度的要求.所提出的扫描方式和校正方法为电子束曝光的三维加工和邻近效应校正提供了一种新方法.
英文摘要：
Considering the characteristics of three-dimensional structures, combining with the overlapped increment scanning method, the proximity effect is corrected in the horizontal and the vertical directions, respectively. The rule tables required by correction are constructed prior. During correction, the needed parameters can be looked up in the tables. So the proximity effect correction can be realized rapidly and accurately in the horizontal direction. The correction in the vertical is based on the relation between the distribution of absorbed energy and the exposure doses. The correction experiments are conducted in SDS-3 electron beam system. The AFM micrographs show that the proximity effect is reduced greatly, and that the corrections of both the horizontal and the vertical can satisfy the precision of three-dimensional fabrication. The scanning and the correction method proposed in the paper can provide a new method of three-dimensional fabrication and proximity effect correction for e-beam system.
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