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Far-field nanostructuring in dielectric materials beyond thediffraction limit using femtosecond lase
  • ISSN号：0387-0200
  • 期刊名称：Review of Laser Engineering
  • 时间：2015.11.1
  • 页码：752-756
  • 相关项目：突破传统双光子层析深度限制的双色双光子显微成像研究
作者： Y. Liao|Y. Cheng|K.J. Sugioka|
同期刊论文项目
突破传统双光子层析深度限制的双色双光子显微成像研究
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